Evolyutsiya teplovogo impul'sa
| AUTHOR | Postnikov Denis Vasil'evich; Blesman Aleksandr Iosifovich |
| PUBLISHER | LAP Lambert Academic Publishing (03/15/2013) |
| PRODUCT TYPE | Paperback (Paperback) |
Description
Ob"ektom issledovaniya yavlyayutsya binarnye sistemy (stal' + pokrytie) pri vozdeystvii na nikh kratkovremennogo teplovogo impul'sa. Tsel' raboty - razrabotka modeli teplovogo vozdeystviya, vyrabotka rekomendatsiy dlya vybora pokrytiya, razrabotka metodik dlya naneseniya pokrytiy i ikh analiticheskoe issledovanie. V protsesse raboty proizvedeny raschety v ramkakh sozdannoy teoreticheskoy modeli, razrabotany i aprobirovany rezhimy ionno-plazmennogo naneseniya pokrytiy na stal'nuyu matritsu. Otrabotany i predlozheny rezhimy predvaritel'noy ionnoy implantatsii matritsy s tsel'yu uluchsheniya adgezii. Issledovany poluchennye binarnye sistemy metodami opticheskoy, elektronnoy (JEOL 5700) i atomnoy silovoy mikroskopii (NTEGRA PRIMA).
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Product Format
Product Details
ISBN-13:
9783659355837
ISBN-10:
3659355836
Binding:
Paperback or Softback (Trade Paperback (Us))
Content Language:
Russian
More Product Details
Page Count:
96
Carton Quantity:
82
Product Dimensions:
6.00 x 0.23 x 9.00 inches
Weight:
0.33 pound(s)
Country of Origin:
US
Subject Information
BISAC Categories
Science | Physics - General
Descriptions, Reviews, Etc.
publisher marketing
Ob"ektom issledovaniya yavlyayutsya binarnye sistemy (stal' + pokrytie) pri vozdeystvii na nikh kratkovremennogo teplovogo impul'sa. Tsel' raboty - razrabotka modeli teplovogo vozdeystviya, vyrabotka rekomendatsiy dlya vybora pokrytiya, razrabotka metodik dlya naneseniya pokrytiy i ikh analiticheskoe issledovanie. V protsesse raboty proizvedeny raschety v ramkakh sozdannoy teoreticheskoy modeli, razrabotany i aprobirovany rezhimy ionno-plazmennogo naneseniya pokrytiy na stal'nuyu matritsu. Otrabotany i predlozheny rezhimy predvaritel'noy ionnoy implantatsii matritsy s tsel'yu uluchsheniya adgezii. Issledovany poluchennye binarnye sistemy metodami opticheskoy, elektronnoy (JEOL 5700) i atomnoy silovoy mikroskopii (NTEGRA PRIMA).
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$62.84